• 18/10/2012
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ASML Acquires Cymer to Accelerate Development of EUV Technology

Dutch lithography systems builder ASML acquires US based Cymer to accelerate supply of light sources for its machines for 1.95 billion euro.

Trefwoorden: #asml, #cymer, #Eric Meurice, #lithography

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( Foto: ASML )

ENGINEERINGNET.EU -- 'The purpose of the acquisition of Cymer is to accelerate the development of Extreme Ultraviolet semiconductor lithography technology', states ASML in a press release.

'This technology is vital to support the semiconductor industry's transition to the next manufacturing technology, which is needed to create microchips with more functions at a lower cost and that are more energy-efficient, consistent with Moore's Law'.

ASML and Cymer have collaborated closely for over a year, but ASML wants to accelerate the delivery process of Cymer's components for its own systems.

Eric Meurice, President and Chief Executive Officer of ASML: "We think we can make EUV technology development significantly more efficient and simplify the supply chain and integration flow of the EUV modules."

"Especially Cymer's growing advanced immersion systems and the installed base of dry deep ultraviolet products are of great importance to us."

ASML intends to manage Cymer's commercial operations as an independent division based in the United States, and will continue to deliver and service light sources for all customers.